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Academic Journal

Suppression of Stress-Induced Defects in FinFET by Implantation and STI Co-Optimization.

Subjects: ION implantation; STRAY currents; OXIDE coating

  • Source: IEEE Transactions on Electron Devices. May2021, Vol. 68 Issue 5, p2587-2589. 3p.

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  • 1-10 of  1,074 results for ""ION implantation""