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Applied Science & Technology Full Text (H.W. Wilson)

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Applied Science & Technology Full Text (H.W. Wilson)

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Applied Science & Technology Full Text (H.W. Wilson)

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Applied Science & Technology Full Text (H.W. Wilson)

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Applied Science & Technology Full Text (H.W. Wilson)

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Applied Science & Technology Full Text (H.W. Wilson)

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Oriented‐Electrochemical Etching of Zn Crystal Edges in Deep Eutectic Solvent for Enhancing Stability and Reversibility of Zn Anodes.

• Authors : Nie, Wei; Tian, Feng; Zhang, Le

Subjects: CRYSTAL etching; EPITAXY; DENDRITIC crystals

• Source: Advanced Functional Materials; 9/25/2024, Vol. 34 Issue 39, p1-11, 11p

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Selective Etching of Si versus Si 1−x Ge x in Tetramethyl Ammonium Hydroxide Solutions with Surfactant.

• Authors : Choi, Yongjoon; Cho, Choonghee; Yoon, Dongmin

Subjects: AMMONIUM hydroxide; ETCHING; TRITON X-100

• Source: Materials (1996-1944); Oct2022, Vol. 15 Issue 19, p6918, 14p

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Wet and dry etching of ultrawide bandgap LiGa5O8 and LiGaO2.

• Authors : Thirupakuzi Vangipuram, Vijay Gopal; Zhang, Kaitian; Zhao, Hongping

Subjects: PLASMA etching; VAPOR-plating; EPITAXY

• Source: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; May2024, Vol. 42 Issue 3, p1-9, 9p

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Etching of elemental layers in oxide molecular beam epitaxy by O2-assisted formation and evaporation of their volatile (sub)oxide: The examples of Ga and Ge.

• Authors : Chen, Wenshan; Egbo, Kingsley; Zhang, Huaide

Subjects: MOLECULAR beam epitaxy; CHEMICAL vapor deposition; ETCHING

• Source: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; May2024, Vol. 42 Issue 3, p1-6, 6p

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