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Thickness measurement of submonolayer native oxide films on silicon wafers.

• Authors : Li, Fuhe; Balazs, Marjorie K.; Deal, Bruce E.

Subjects: SEMICONDUCTOR etching; SEMICONDUCTOR wafers

• Source: Solid State Technology. Feb2000, Vol. 43 Issue 2, p87. 6p. 1 Diagram, 5 Graphs.

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Silicon-rich-methacrylate bilayer resist for 193-nm...

• Authors : Blakeney, Andrew; Gabor, Allen; White, Daniela

Subjects: PHOTORESISTS; SILICON; METHYL methacrylate

• Source: Solid State Technology. Jun98, Vol. 41 Issue 6, p69. 6p. 4 Black and White Photographs, 4 Diagrams, 2 Charts.

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Safe usage of CIF3: Supply, vacuum service and exhaust gas management.

• Authors : Pierce, A.M.; Taylor, M.

Subjects: CHEMICAL vapor deposition equipment

• Source: Solid State Technology. Sep97, Vol. 40 Issue 9, p107. 5p. 1 Color Photograph, 3 Diagrams, 2 Charts, 5 Graphs.

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Solid State Technology resource guide.

Subjects: SEMICONDUCTOR industry; DIRECTORIES

• Source: Solid State Technology. Mar96 Supplement, Vol. 39 Issue 3, p1. 303p.

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Oxygen, carbon, and nitrogen quantification by high-energy resonance backscattering.

• Authors : Li, Jian; Moghadam, F.

Subjects: THIN films; BACKSCATTERING; SEMICONDUCTOR films

• Source: Solid State Technology. May95, Vol. 38 Issue 5, p61. 4p. 1 Diagram, 5 Graphs.

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Using SIMS to detect contamination sources from ion implanters.

• Authors : Stevie, F.A.; Wilson, R.G.

Subjects: ION implantation; SECONDARY ion mass spectrometry

• Source: Solid State Technology. May95, Vol. 38 Issue 5, p51. 6p. 1 Diagram, 1 Chart, 7 Graphs.

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