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Applied Science & Technology Full Text (H.W. Wilson)

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LOW K GETS A DELAY.

• Authors : McCoy, Michaela

Subjects: INSULATING materials; DIELECTRIC devicesCALIFORNIA; SAN Francisco (Calif.); UNITED States

• Source: Chemical & Engineering News. 8/12/2002, Vol. 80 Issue 32, p17. 2p. 1 Color Photograph, 1 Graph.

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Applied Science & Technology Full Text (H.W. Wilson)

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Applied Science & Technology Full Text (H.W. Wilson)

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Applied Science & Technology Full Text (H.W. Wilson)

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Destruction of formaldehyde with dielectric barrier discharge plasmas.

• Authors : Chang, Moo Been; Lee, Chin Ching

Subjects: *Formaldehyde; Dielectric devices

• Source: Environmental Science & Technology. Jan1995, Vol. 29 Issue 1, p181. 6p. 2 Diagrams, 6 Graphs.

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An Empirically Validated Analytical Model of Droplet Dynamics in Electrowetting on Dielectric Devices.

• Authors : Schertzer, M. J.; Gubarenko, S. I.; Ben-Mrad, R.

• Source: Langmuir; Dec2010, Vol. 26 Issue 24, p19230-19238, 9p

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Dielectric Screening Enhanced Performance in Graphene FET.

• Authors : Chen, Fang¹; Xia, Jilin¹; Ferry, David K.¹

Subjects: *FIELD-effect transistors; *DIELECTRIC devices; *SOLVENTS

• Source: Nano Letters. Jul2009, Vol. 9 Issue 7, p2571-2574. 4p.

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The Dielectric Impact of Layer Distances on Exciton and Trion Binding Energies in van der Waals Heterostructures.

• Authors : Florian, Matthias¹ ; Hartmann, Malte¹; Steinhoff, Alexander¹

Subjects: *DIELECTRIC devices; *HETEROSTRUCTURES; *CHALCOGENIDES

• Source: Nano Letters. 4/11/2018, Vol. 18 Issue 4, p2725-2732. 8p.

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Droplet Translation Actuated by Photoelectrowetting.

• Authors : Palma, Cesar¹; Deegan, Robert D.²

Subjects: *ELECTRODES; *DIELECTRIC devices; *FABRICATION (Manufacturing)

• Source: Langmuir. 3/13/2018, Vol. 34 Issue 10, p3177-3185. 9p.

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