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  • 1-9 of  9 results for ""INDUCTIVELY coupled plasma mass spectrometry""
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Academic Journal

Enhanced ICP-MS for trace metal purity levels.

Subjects: *INDUCTIVELY coupled plasma mass spectrometry; *METAL detectors

  • Source: Solid State Technology. May2002, Vol. 45 Issue 5, p56. 1/2p. 1 Chart.

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Academic Journal

Product news.

Subjects: *SEMICONDUCTOR industry; *EQUIPMENT & supplies

  • Source: Solid State Technology. Mar97, Vol. 40 Issue 3, p117. 6p. 6 Color Photographs.

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Academic Journal

Cu contamination control for advanced interconnect manufacturing.

Subjects: *SEMICONDUCTOR wafers; *MICROELECTRONICS; *SEMICONDUCTORS

  • Source: Solid State Technology. May2000, Vol. 43 Issue 5, p137. 6p. 1 Color Photograph, 1 Diagram, 2 Graphs.

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Academic Journal

Addressing Cu contaminaiton via spin-etch cleaning.

Subjects: *METAL finishing; *COPPER testing; *ELECTROPLATING

  • Source: Solid State Technology. Nov99, Vol. 42 Issue 11, p63. 5p. 1 Color Photograph, 2 Charts, 2 Graphs.

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Academic Journal

Performance of a POU purifier in ionic contamination removal.

Subjects: *CHEMICAL purification

  • Source: Solid State Technology. Aug96, Vol. 39 Issue 8, p77. 5p. 3 Charts, 8 Graphs.

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Academic Journal

Using SIMS to detect contamination sources from ion implanters.

Subjects: *ION implantation; *SECONDARY ion mass spectrometry

  • Source: Solid State Technology. May95, Vol. 38 Issue 5, p51. 6p. 1 Diagram, 1 Chart, 7 Graphs.

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  • 1-9 of  9 results for ""INDUCTIVELY coupled plasma mass spectrometry""