Safe usage of CIF3: Supply, vacuum service and exhaust gas management.

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  • Author(s): Pierce, A.M.; Taylor, M.
  • Source:
    Solid State Technology. Sep97, Vol. 40 Issue 9, p107. 5p. 1 Color Photograph, 3 Diagrams, 2 Charts, 5 Graphs.
  • Additional Information
    • Subject Terms:
      CHEMICAL vapor deposition equipment
    • Abstract:
      Focuses on chlorine triflouride (CIF3), a highly reactive process gas used in chemical vapor deposition and diffusion furnace applications for nonplasma cleans. System design of CIF3; CIF3 gas supply system; Safe usage of CIF3.