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Next-Generation Lithography Takes UV Light To The Extreme.
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- Author(s): Edwards, John
- Source:
Electronic Design. 5/10/2007, Vol. 55 Issue 10, p23-23. 3/4p. 1 Color Photograph.
- Additional Information
- Subject Terms:
- Subject Terms:
- Abstract:
The article focuses on the potential of extreme-ultraviolet (EUV) light technology, a project by the University of Central Florida's laser plasma laboratory in Orlando. The project serves as an alternative to deep-ultraviolet lithography in carving circuit patterns on silicon wafers during semiconductor processes. Such alternative is believed to be the largest technology transition that a computer chip industry adopts, since a short light source enables the minimum feature size on a chip to go down as low as 12 nanometer. Such technology is effective in eliminating the neutral and charged particles produced by existing EUV plasma sources, because stream particles are said to affect the performance and operational life of steppers.
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